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Atomic layer deposited high-kappa films and their role in metal-insulator-metal capacitors for Si RF/analog integrated circuit applications Zhu, CX; Cho, Byung Jin; Li, MF, CHEMICAL VAPOR DEPOSITION, v.12, no.2-3, pp.165 - 171, 2006-03 |
Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure Ahn, Ji-Hoon; Kim, Ja Yong; Jeong, Seong-Jun; Kwon, Se-Hun, MATERIALS RESEARCH BULLETIN, v.64, pp.1 - 5, 2015-04 |
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