Browse by Subject MICROWAVE PLASMA

Showing results 1 to 8 of 8

1
A comparative study of rotational temperatures using diatomic OH, O-2 and N-2(+) molecular spectra emitted from atmospheric plasmas

Moon, SY; Choe, Wonho, SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, v.58, pp.249 - 257, 2003-02

2
Charged cluster model in the low pressure synthesis of diamond

Hwang, NM; Hahn, JH; Yoon, Duk Yong, JOURNAL OF CRYSTAL GROWTH, v.162, no.1-2, pp.55 - 68, 1996-04

3
Chemical potential of carbon in the low pressure synthesis of diamond

Hwang, NM; Hahn, JH; Yoon, Duk Yong, JOURNAL OF CRYSTAL GROWTH, v.160, no.1-2, pp.87 - 97, 1996-03

4
Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

Ryu, Ho Jin; Kim, SH; Hong, Soon-Hyung, MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, v.277, no.1-2, pp.57 - 63, 2000-01

5
NUCLEATION BEHAVIOR OF DIAMOND PARTICLES ON SILICON SUBSTRATES IN A HOT-FILAMENT CHEMICAL VAPOR-DEPOSITION

PARK, SS; Lee, Jai Young, JOURNAL OF MATERIALS SCIENCE, v.28, no.7, pp.1799 - 1804, 1993-04

6
THE EFFECTS OF OXYGEN ON DIAMOND SYNTHESIS BY HOT-FILAMENT CHEMICAL-VAPOR-DEPOSITION

KIM, YK; JUNG, JH; Lee, Jai Young; AHN, HJ, JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, v.6, no.1, pp.28 - 33, 1995-02

7
THE GROWTH-KINETICS OF DIAMOND FILMS DEPOSITED BY HOT-FILAMENT CHEMICAL VAPOR-DEPOSITION

KWEON, DW; Lee, Jai Young; KIM, DH, JOURNAL OF APPLIED PHYSICS, v.69, no.12, pp.8329 - 8335, 1991-06

8
Thermodynamic approach to the paradox of diamond formation with simultaneous graphite etching in the low pressure synthesis of diamond

Hwang, NM; Yoon, Duk Yong, JOURNAL OF CRYSTAL GROWTH, v.160, no.1-2, pp.98 - 103, 1996-03

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