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Showing results 1 to 6 of 6

1
Cycle-CVD법을 이용한 tantalum oxide 원자층 단위 증착 및 특성에 관한 연구 = A study on atomic layer deposition and film characteristics of tantalum oxide using cycle-CVDlink

송현정; Song, Hyun-Jung; et al, 한국과학기술원, 1998

2
DC reactive sputtering법을 이용한 $RuO_x$ 하부전극 형성과 고유전 $(Ba,Sr)TiO_3$ 박막의 특성 평가에 관한 연구 = Preparation of $RuO_x$ bottom electrode by DC reactive sputtering and characterization of $(Ba,Sr)TiO_3$ thin filmslink

안준형; Ahn, Joon-Hyung; et al, 한국과학기술원, 1998

3
Effect of catalyst for nickel films for NiSi formation with improved interface roughness

Kang, Hee-Sung; Ha, Jong-Bong; Lee, Jung-Hee; Choi, Chi Kyu; Lee, JeongYong; Lee, Kwang-Man, THIN SOLID FILMS, v.519, pp.6658 - 6661, 2011-08

4
Monolithic Encapsulation of Implantable Neuroprosthetic Devices Using Liquid Crystal Polymers

Lee, Seung Woo; Min, Kyou Sik; Jeong, Joonsoo; Kim, Junghoon; Kim, Sung June, IEEE TRANSACTIONS ON BIOMEDICAL ENGINEERING, v.58, no.8, 2011-08

5
The electrical properties of dielectric stacks of SiO2 and Al2O3 prepared by atomic layer deposition method

Han, Byeol; Lee, Seung-Won; Park, Kwangchol; Park, Chong-Ook; Rha, Sa-Kyun; Lee, Won-Jun, CURRENT APPLIED PHYSICS, v.12, no.2, pp.434 - 436, 2012-03

6
고유전 (Ba,Sr)$TiO_3$ 박막 커패시터의 유전완화전류와 누설전류에 관한 연구 = A study on dielectric relaxation current and leakage current of high dielectric (Ba,Sr)$TiO_3$ thin film capacitorlink

장훈; Jang, Hoon; et al, 한국과학기술원, 1999

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