Browse by Subject GLOW-DISCHARGE
Showing results 1 to 18 of 18
| A study on low dielectric material deposition using a helicon plasma source Kim, JH; Seo, SH; Yun, SM; Chang, Hong-Young; Lee, KM; Choi, CK, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.143, no.9, pp.2990 - 2995, 1996-09 |
| Anomalous evolution of Ar metastable density with electron density in high density Ar discharge Park, Min; Chang, Hong-Young; You, Shin-Jae; Kim, Jung-Hyung; Shin, Yong-Hyeon, PHYSICS OF PLASMAS, v.18, no.10, 2011-10 |
| Antenna configuration for uniform large-area inductively coupled plasma production Kim, SS; Chang, Hong-Young; Chang, Choong-Seock; Yoon, NS, APPLIED PHYSICS LETTERS, v.77, no.4, pp.492 - 494, 2000-07 |
| Capacitive discharge mode transition in moderate and atmospheric pressure Moon, Se-Youn; Rhee, J. K.; Kim, Dan-Bee; Gweon, Bo-Mi; Choe, Won-Ho, CURRENT APPLIED PHYSICS, v.9, no.1, pp.274 - 277, 2009-01 |
| Comprehensive Comparison of Various Techniques for the Analysis of Elemental Distributions in Thin Films Abou-Ras, D.; Caballero, R.; Fischer, C. -H.; Kaufmann, C. A.; Lauermann, I.; Mainz, R.; Moenig, H.; et al, MICROSCOPY AND MICROANALYSIS, v.17, no.5, pp.728 - 751, 2011-10 |
| Control of radio-frequency atmospheric pressure argon plasma characteristics by helium gas mixing Moon, SY; Han, JW; Choe, Wonho, PHYSICS OF PLASMAS, v.13, pp.95 - 107, 2006-01 |
| Deposition and 1.54 mu m Er3+ luminescent properties of erbium-doped hydrogenated amorphous silicon thin films by electron cyclotron resonance plasma enhanced chemical vapor deposition of SiH4 with concurrent sputtering of erbium Shin, JungHoon; Kim, MJ, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.17, no.6, pp.3230 - 3234, 1999 |
| Development of a helium flow sensor based on dielectric barrier discharge at atmospheric pressure Kim, Tae Hoon; Kim, Sung Jin, SENSORS AND ACTUATORS A-PHYSICAL, v.167, pp.297 - 303, 2011-06 |
| Effects of silicon-hydrogen bond characteristics on the crystallization of hydrogenated amorphous silicon films prepared by plasma enhanced chemical vapor deposition hae-yeol kim; jae-beom choi; Lee, Jai-Young, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.17, no.6, pp.3240 - 3245, 1999 |
| Electron density and temperature measurement by continuum radiation emitted from weakly ionized atmospheric pressure plasmas Park, Sang Hoo; Choe, Wonho; Moon, Se Youn; Park, Jaeyoung, APPLIED PHYSICS LETTERS, v.104, no.8, 2014-02 |
| Helicon plasma generation at very high radio frequency Eom, GS; Bae, ID; Cho, Gyuseong; Hwang, YS; Choe, Wonho, PLASMA SOURCES SCIENCE TECHNOLOGY, v.10, no.3, pp.417 - 422, 2001-08 |
| Highly conductive boron-doped nanocrystalline silicon-carbide film prepared by low-hydrogen-dilution photo-CVD method using ethylene as a carbon source Myong, SY; Lee, HK; Yoon, E; Lim, Koeng Su, JOURNAL OF NON-CRYSTALLINE SOLIDS, v.298, no.2-3, pp.131 - 136, 2002-03 |
| Nonlocal electron kinetics in a planar inductive helium discharge Seo, SH; Chung, CW; Hong, JI; Chang, Hong-Young, PHYSICAL REVIEW E, v.62, no.5, pp.7155 - 7167, 2000-11 |
| Numerical investigation on plasma and poly-Si etching uniformity control over a large area in a resonant inductively coupled plasma source S. S. Kim; S. Hamaguchi; N. S. Yoon; Chang, Choong-Seock; Y. D. Lee; S. H. Ku, PHYSICS OF PLASMAS, v.8, no.4, pp.1384 - 1394, 2001-04 |
| Oxygen plasma surface treatment of polymer powder in a fluidized bed reactor Park, SH; Kim, Sang Done, COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS, v.133, no.1-2, pp.33 - 39, 1998-02 |
| Strong influence of boron doping on nanocrystalline silicon-carbide formation by using photo-CVD technique Myong, SY; Shevaleevskiy, O; Lim, Koeng Su; Miyajima, S; Konagai, M, JOURNAL OF NON-CRYSTALLINE SOLIDS, v.351, pp.89 - 92, 2005-01 |
| Surface treatment of polymeric fine powders by CF4 plasma in a circulating fluidized bed reactor Jung S.H.; Park S.H.; Kim, Sang Done, JOURNAL OF CHEMICAL ENGINEERING OF JAPAN, v.37, no.2, pp.166 - 173, 2004 |
| The influence of hydrogen dilution ratio on the crystallization of hydrogenated amorphous silicon films prepared by plasma-enhanced chemical vapor deposition Kim, HY; Lee, KY; Lee, Jai Young, THIN SOLID FILMS, v.302, no.1-2, pp.17 - 24, 1997-06 |
Discover
Type
Open Access
Date issued
- 31,172 2020 - 2024
- 99,968 2010 - 2019
- 75,670 2000 - 2009
- 44,727 1990 - 1999
- 14,360 1980 - 1989
- 62 1964 - 1969