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Showing results 1 to 10 of 10

1
Characterization of a high-frequency inductively coupled plasma source

Lee, DS; Jun, HS; Chang, Hong-Young, THIN SOLID FILMS, v.506, pp.469 - 473, 2006-05

2
Characterization of pulsed plasma in unbalanced magnetron argon discharge

Lee, SW; Seo, SH; In, JH; Chung, CW; Chang, Hong-Young, PHYSICS OF PLASMAS, v.12, pp.297 - 301, 2005-06

3
Effect of duty cycle on plasma parameters in the pulsed dc magnetron argon discharge

Seo, SH; In, JH; Chang, Hong-Young; Han, JG, APPLIED PHYSICS LETTERS, v.86, pp.361 - 376, 2005-06

4
Experimental investigation of plasma dynamics in dc and short-pulse magnetron discharges

Seo, SH; In, JH; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.15, pp.256 - 265, 2006-05

5
Fast measurement of a pulsed plasma using a Fourier cutoff probe

Na, Byung-Keun; You, Kwang-Ho; Kim, D. -W.; Seo, Byong-Hoon; Chang, Hong-Young; You, S. -J.; Lee, Yun-Seong, JOURNAL OF INSTRUMENTATION, v.7, 2012-04

6
Influence of N-2 gas pressure on the chemical bonds of amorphous carbon nitride films

Roh, Ki-Min; You, Shin-Jae; Choi, Si-Kyung; Kim, Jung-Hyung; Seong, Dae-Jin, JOURNAL OF PHYSICS D-APPLIED PHYSICS, v.42, no.17, pp.175405 - 175411, 2009-09

7
On anomalous temporal evolution of gas pressure in inductively coupled plasma

Seo, Byong-Hoon; You, S. J.; Kim, J. H.; Seong, D. J.; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.102, no.13, pp.134104, 2013-04

8
Review of heating mechanism in inductively coupled plasma

Seo, SH; Chung, CW; Chang, Hong-Young, SURFACE COATINGS TECHNOLOGY, v.131, no.1-3, pp.1 - 11, 2000-09

9
Role of transverse magnetic field in the capacitive discharge

You, SJ; Hai, TT; Park, M; Kim, DW; Kim, JH; Seong, DJ; Shin, YH; et al, THIN SOLID FILMS, v.519, pp.6981 - 6989, 2011-08

10
The finite size effect in a planar inductively coupled plasma

Chung, CW; Kim, SS; Seo, SH; Chang, Hong-Young; Yoon, NS, JOURNAL OF APPLIED PHYSICS, v.88, no.2, pp.1181 - 1183, 2000-07

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