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A positive-working alkaline developable photoresist based on partially tert-Boc-protected calix[4]resorcinarene and a photoacid generator Young-Gil, K; Kim, Jin-Baek; Fujigaya, T; Shibasaki, Y; Ueda, M, JOURNAL OF MATERIALS CHEMISTRY, v.12, no.1, pp.53 - 57, 2002 |
Research Updates on Graphene Oxide-Based Polymeric Nanocomposites Maheshkumar, K. V.; Krishnamurthy, K.; Sathishkumar, P.; Sahoo, S.; Uddin, E.; Pal, S. K.; Rajasekar, R., POLYMER COMPOSITES, v.35, no.12, pp.2297 - 2310, 2014-12 |
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