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Adhesion-promoted copolymers based on norbornene derivatives and maleic anhydride for 193-nm photoresists Kim, Jin-Baek; Yun, HJ; Kwon, YG; Lee, BW, POLYMER, v.41, no.22, pp.8035 - 8039, 2000-10 |
Photobleaching photoacid generator Kim, Jin-Baek; Jang, J.-H.; Kim, H.-W.; Woo, S.-G., JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, v.14, no.3, pp.341 - 344, 2001 |
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