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Showing results 1 to 11 of 11

1
alpha, gamma, and normal, abnormal glow discharge modes in radio-frequency capacitively coupled discharges at atmospheric pressure

Moon, SY; Rhee, JK; Kim, DB; Choe, Wonho, PHYSICS OF PLASMAS, v.13, pp.65 - 70, 2006-03

2
Development of a dual inductively coupled plasma source for direct and remote plasma generation in a reactor

Uhm, S; Lee, KH; Chang, Hong-Young; Chung, CW, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS REVIEW PAPERS, v.44, no.2, pp.1081 - 1085, 2005-02

3
Experimental investigation of plasma dynamics in dc and short-pulse magnetron discharges

Seo, SH; In, JH; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.15, pp.256 - 265, 2006-05

4
Heating-mode transition in the capacitive mode of inductively coupled plasmas

Chung, CW; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.80, no.10, pp.1725 - 1727, 2002-03

5
Nonlocal electron kinetics in a planar inductive helium discharge

Seo, SH; Chung, CW; Hong, JI; Chang, Hong-Young, PHYSICAL REVIEW E, v.62, no.5, pp.7155 - 7167, 2000-11

6
On a dual inductively coupled plasma for direct and remote plasma in a reactor

Uhm, S; Lee, KH; Chang, Hong-Young; Chung, CW, PHYSICS OF PLASMAS, v.11, pp.4830 - 4836, 2004-10

7
Parametric study on excitation temperature and electron temperature in low pressure plasmas

Park, Hoyong; Choe, Wonho, CURRENT APPLIED PHYSICS, v.10, pp.1456 - 1460, 2010-11

8
Review of heating mechanism in inductively coupled plasma

Seo, SH; Chung, CW; Chang, Hong-Young, SURFACE COATINGS TECHNOLOGY, v.131, no.1-3, pp.1 - 11, 2000-09

9
The electron bounce resonance in a low-pressure solenoidal inductive discharge

Chung, CW; You, KI; Seo, SH; Kim, SS; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.6, pp.2992 - 2997, 2001-06

10
The finite size effect in a planar inductively coupled plasma

Chung, CW; Kim, SS; Seo, SH; Chang, Hong-Young; Yoon, NS, JOURNAL OF APPLIED PHYSICS, v.88, no.2, pp.1181 - 1183, 2000-07

11
The radio frequency magnetic field effect on electron heating in a low frequency inductively coupled plasma

Chung, C; Seo, SH; Chang, Hong-Young, PHYSICS OF PLASMAS, v.7, no.9, pp.3584 - 3587, 2000-09

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