Showing results 2 to 5 of 5
Poly (2-trimethylsilyl-2-propyl methacrylate-co-gamma-butyrolactone-2-yl methacrylate) for ArF lithography Kim, Jin-Baek; Kim, H; Lee, SH; Moon, JT, POLYMER, v.40, no.18, pp.5213 - 5217, 1999-08 |
Synthesis and characterization of norbomene-based polymers with 7,7-dimethyloxepan-2-one acid labile groups for chemically amplified photoresists Kim, Jin-Baek; Lee, JJ, POLYMER, v.43, no.6, pp.1963 - 1967, 2002-03 |
Synthesis and lithographic evaluation of poly [(methaerylic acid tert-butyl cholate ester)-co-(-gamma-butyrolactone-2-yl methacrylate)] Kim, Jin-Baek; Ko, JS; Choi, JH; Jang, JH; Oh, TH; Kim, HW; Lee, BW, POLYMER, v.45, no.16, pp.5397 - 5401, 2004-07 |
Synthesis of a novel methacrylate, (1,4-dioxa-8-methacrylate amide spiro [4,5] decane) monomer and its co-polymerization with t-butyl-3 alpha-methacryloxy-7 alpha, 12 alpha-dihydroxy-5 beta cholan-24-oate for 193 nm photoresist Karak, N; Ko, JS; Kim, Jin-Baek, JOURNAL OF POLYMER MATERIALS, v.19, pp.365 - 372, 2002-12 |
Discover