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Optical properties of Si-O-N-F films as a phase shift mask material for 157 nm optical lithography Kim, SK; Kang, MA; Sohn, JM; Kim, SH; No, Kwangsoo, OPTICAL MATERIALS, v.22, no.4, pp.361 - 367, 2003-06 |
금속-유전체로 이루어진 광자 결정의 투과율에 관한 연구 = Study on the transmittance of metallo-dielectric photonic crystalslink 최영경; Choi, Young-Kyoung; et al, 한국과학기술원, 2003 |
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