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Showing results 13 to 18 of 18

13
Nonlocal electron kinetics in a planar inductive helium discharge

Seo, SH; Chung, CW; Hong, JI; Chang, Hong-Young, PHYSICAL REVIEW E, v.62, no.5, pp.7155 - 7167, 2000-11

14
Numerical investigation on plasma and poly-Si etching uniformity control over a large area in a resonant inductively coupled plasma source

S. S. Kim; S. Hamaguchi; N. S. Yoon; Chang, Choong-Seock; Y. D. Lee; S. H. Ku, PHYSICS OF PLASMAS, v.8, no.4, pp.1384 - 1394, 2001-04

15
Oxygen plasma surface treatment of polymer powder in a fluidized bed reactor

Park, SH; Kim, Sang Done, COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS, v.133, no.1-2, pp.33 - 39, 1998-02

16
Strong influence of boron doping on nanocrystalline silicon-carbide formation by using photo-CVD technique

Myong, SY; Shevaleevskiy, O; Lim, Koeng Su; Miyajima, S; Konagai, M, JOURNAL OF NON-CRYSTALLINE SOLIDS, v.351, pp.89 - 92, 2005-01

17
Surface treatment of polymeric fine powders by CF4 plasma in a circulating fluidized bed reactor

Jung S.H.; Park S.H.; Kim, Sang Done, JOURNAL OF CHEMICAL ENGINEERING OF JAPAN, v.37, no.2, pp.166 - 173, 2004

18
The influence of hydrogen dilution ratio on the crystallization of hydrogenated amorphous silicon films prepared by plasma-enhanced chemical vapor deposition

Kim, HY; Lee, KY; Lee, Jai Young, THIN SOLID FILMS, v.302, no.1-2, pp.17 - 24, 1997-06

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