Showing results 2 to 3 of 3
Reduction of charge trapping in HfO2 film on a Ge substrate by trimethylaluminum pretreatment Lee, Jae Jin; Shin, Yunsang; Choi, Juyun; Kim, Hyoungsub; Hyun, Sangjin; Choi, Siyoung; Cho, Byung Jin; et al, PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, v.6, no.11, pp.439 - 441, 2012-11 |
Silicon epitaxial film growth on silicon substrate exposed to UV-excited NF3/H-2 gas for native oxide removal Kwon, SK; Kim, DoHyun; Baek, JT, JOURNAL OF CRYSTAL GROWTH, v.198, no.2, pp.1039 - 1044, 1999-03 |
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