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Showing results 4 to 13 of 13

4
Feature of electron energy distribution in a low-pressure capacitive discharge

You, SJ; Chung, CW; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.87, pp.3751 - 3762, 2005-07

5
Gap length effect on electron energy distribution in capacitive radio frequency discharges

You, S. J.; Kim, S. S.; Kim, Jung-Hyung; Seong, Dae-Jin; Shin, Yong-Hyeon; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.91, no.22, 2007-11

6
Low energy electron cooling induced by a magnetic field in high pressure capacitive radio frequency discharges

You, SJ; Kim, SS; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.85, pp.4872 - 4874, 2004-11

7
Measurements of Electron Energy Probability Functions in inductively coupled plasma with laser Thomson scattering

Seo, B. H.; You, S. J.; You, G. H.; Kim, J. H.; Yoo, Y. S.; Seong, D. J.; Chang, H. Y., JOURNAL OF INSTRUMENTATION, v.7, 2012-01

8
On anomalous temporal evolution of gas pressure in inductively coupled plasma

Seo, Byong-Hoon; You, S. J.; Kim, J. H.; Seong, D. J.; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.102, no.13, pp.134104, 2013-04

9
Role of low-frequency power in dual-frequency capacitive discharges

Ahn, Seung Kyu; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.95, no.11, 2009-09

10
Role of transverse magnetic field in the capacitive discharge

You, SJ; Hai, TT; Park, M; Kim, DW; Kim, JH; Seong, DJ; Shin, YH; et al, THIN SOLID FILMS, v.519, pp.6981 - 6989, 2011-08

11
Spatio-temporally resolved electron temperature in argon radio-frequency capacitive discharge at atmospheric pressure

Park, Sanghoo; Choe, Wonho; Moon, Se Youn; Yoo, Suk Jae, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.24, no.3, 2015-05

12
Strong variation of average ion energy in oscillation frequency of sheath potential

Lee, Young D.; Kim, SS; Ku, SH; Chang, Choong-Seock, Physics of Plasmas, v.7, no.2, pp.766 - 769, 2000-02

13
The nonlocal and local property of the electron energy distribution function in a low-pressure inductively coupled plasma

Chung, C; Chang, Hong-Young, PHYSICS OF PLASMAS, v.7, no.9, pp.3826 - 3828, 2000-09

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