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Showing results 1 to 3 of 3

1
High-κ Dielectric (HfO2)/2D Semiconductor (HfSe2) Gate Stack for Low-Power Steep-Switching Computing Devices

Kang, Taeho; Park, Joonho; Jung, Hanggyo; Choi, Haeju; Lee, Sang‐Min; Lee, Nayeong; Lee, Ryong Gyu; et al, ADVANCED MATERIALS, v.36, no.26, 2024-06

2
Reduction of charge trapping in HfO2 film on a Ge substrate by trimethylaluminum pretreatment

Lee, Jae Jin; Shin, Yunsang; Choi, Juyun; Kim, Hyoungsub; Hyun, Sangjin; Choi, Siyoung; Cho, Byung Jin; et al, PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, v.6, no.11, pp.439 - 441, 2012-11

3
Silicon epitaxial film growth on silicon substrate exposed to UV-excited NF3/H-2 gas for native oxide removal

Kwon, SK; Kim, DoHyun; Baek, JT, JOURNAL OF CRYSTAL GROWTH, v.198, no.2, pp.1039 - 1044, 1999-03

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