UV patternable high refractive index inorganic-organic hybrid materials prepared by sol-gel process can be nanoimprinted in order to get photonic crystal nanopatterns. Non-hydrolytic sol-gel process can make a UV curable and relatively high refractive index hybrid material, which can be cured without a significant shrinkage for nanoimprinting. Sol-gel process of heterogeneously functionalized silicon alkoxides can make the organically modified inorganic Si-O-Ti network very well. The UV-based nanoimprint technique utilizes transparent templates and UV curable high refractive index materials to allow pattern replication at room temperature and very low pressure. UV-based nanoimprint technique is an efficient way to fabricate this sort of polymeric photonic crystal nanostructures.