ECR 플라즈마를 이용한 실리콘질화 박막 증착Silicon Nitride Thin Film Deposition Using ECR Plasma
- Publisher
- 한국표면공학회
- Issue Date
- 1990
- Language
- Korean
- Citation
한국표면공학회지, v.23, no.4, pp.218 - 224
- ISSN
- 1225-8024
- Appears in Collection
- PH-Journal Papers(저널논문)
- Files in This Item
- There are no files associated with this item.
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