Superior Carrier Mobility of Ge MOSFETs Depending on Channel Orientation with EOT of 0.57 nm Using Y-ZrO2/GeOx/Ge Stack
- Publisher
- 연세대학교, 한국반도체산업협회, 한국반도체연구조합
- Issue Date
- 2020-02-13
- Language
- English
- Citation
제27회 한국반도체학술대회
- Appears in Collection
- EE-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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