Plasma producing apparatus and substrate board treatment 플라즈마 발생 장치 및 기판 처리 장치

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Disclose a kind of plasma producing apparatus i.e. substrate board treatment.The plasma producing apparatus includes: the multiple grounding electrodes for being arranged in inside vacuum tank and extending parallel to one another;And the power electrode being arranged between grounding electrode.There are the region of constant distance between grounding electrode and power electrode, power electrode is tapered on the direction in face of substrate.Power electrode is connected to RF power source, and on the direction in face of substrate, and the height of power electrode is greater than the height of grounding electrode.
Assignee
KAIST
Country
CC (Cocos Islands)
Issue Date
2019-05-21
Application Date
2012-03-29
Application Number
201610318718.4
Registration Date
2019-05-21
Registration Number
106024568
URI
http://hdl.handle.net/10203/264143
Appears in Collection
PH-Patent(특허)
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