Fourier spectrum based extraction of an equivalent trap state density in indium gallium zinc oxide transistors

Cited 1 time in webofscience Cited 0 time in scopus
  • Hit : 187
  • Download : 0
Segregating the dynamics of gate bias induced threshold voltage shift, and in particular, charge trapping in thin film transistors (TFTs) based on time constants provides insight into the different mechanisms underlying TFTs instability. In this Letter we develop a representation of the time constants and model the magnitude of charge trapped in the form of an equivalent density of created trap states. This representation is extracted from the Fourier spectrum of the dynamics of charge trapping. Using amorphous In-Ga-Zn-O TFTs as an example, the charge trapping was modeled within an energy range of Delta E-t approximate to 0.3 eV and with a density of state distribution as D-t(Et-j) = D-t0 exp(-Delta E-t/kT) with D-t0 = 5.02 x 10(11) cm(-2) eV(-1). Such a model is useful for developing simulation tools for circuit design. (C) 2014 AIP Publishing LLC.
Publisher
AMER INST PHYSICS
Issue Date
2014-05
Language
English
Article Type
Article
Keywords

THIN-FILM TRANSISTORS; THRESHOLD-VOLTAGE SHIFT; HYDROGENATED AMORPHOUS-SILICON; RELAXATION; DEPENDENCE; MODEL; TIME; BIAS

Citation

APPLIED PHYSICS LETTERS, v.104, no.20

ISSN
0003-6951
DOI
10.1063/1.4879554
URI
http://hdl.handle.net/10203/240792
Appears in Collection
EE-Journal Papers(저널논문)
Files in This Item
There are no files associated with this item.
This item is cited by other documents in WoS
⊙ Detail Information in WoSⓡ Click to see webofscience_button
⊙ Cited 1 items in WoS Click to see citing articles in records_button

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0