Transferrable Plasmonic Au Thin Film Containing Sub-20 nm Nanohole Array Constructed via High-Resolution Polymer Self-Assembly and Nanotransfer Printing

Abstract

The fabrication and characterization of nanoscale hole arrays (NHA) have been extensively performed for a variety of unique characteristics including extraordinary optical transmission phenomenon observed for plasmonic NHAs. Although the size miniaturization and hole densification are strongly required for enhancement of high-frequency optical responses, from a practical point-of-view, it is still not straightforward to manufacture NHA using conventional lithography techniques. Herein, a facile, cost-effective, and transferrable fabrication route for high-resolution and high-density NHA with sub-50 nm periodicity is demonstrated. Solvent-assisted nanotransfer printing with ultrahigh-resolution combined with block copolymer self-assembly is used to fabricate well-defined Si nanomesh master template with 4-fold symmetry. An Au NHA film on quartz substrate is then obtained by thermal-evaporation on the Si master and subsequent transfer of the sample, resulting in NHA structure having a hole with a diameter of 18 nm and a density over 400 holes/mu m(2). A resonance peak at the wavelength of 650 nm, which is not present in the transmittance spectrum of a flat Au film, is observed for the Au NHA film. Finite-difference time-domain (FDTD) simulation results propose that the unexpected peak appears because of plasmonic surface guiding mode. The position of the resonance peak shows the sensitivity toward the change of the refractive index of surrounding medium, suggesting it as a promising label-free sensor application. In addition, other types of Au nanostructure arrays such as geometry-controlled NHA and nanoparticle arrays (NPAs) shows the outstanding versatility of our approach.