Directed self-assembly of block copolymers for universal nanopatterning

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Block copolymers (BCP) are self-assembling polymeric materials that have been extensively investigated for several decades. Recently, directed self-assembly (DSA) of BCPs has received enormous research attention from both academia and industry as next-generation nanolithography technology. This article provides a brief introduction to (i) the spontaneous and directed self-assembly of BCPs, (ii) the orientation and lateral ordering of BCP nanopatterns and their relationships with DSA strategies, (iii) various potential applications of BCP nanopatterning, and (iv) mussel-inspired BCP nanopatterning for arbitrary substrate materials including low surface energy materials.
Publisher
ROYAL SOC CHEMISTRY
Issue Date
2013-03
Language
English
Article Type
Article
Keywords

SOFT GRAPHOEPITAXY; SURFACE PATTERNS; LARGE-AREA; LITHOGRAPHY; TEMPLATES; GRAPHENE; POLYMER; ARRAYS; PHOTORESIST; FABRICATION

Citation

SOFT MATTER, v.9, no.10, pp.2780 - 2786

ISSN
1744-683X
DOI
10.1039/c2sm27535j
URI
http://hdl.handle.net/10203/174641
Appears in Collection
MS-Journal Papers(저널논문)
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