Browse by Subject interference lithography
Showing results 1 to 7 of 7
| Concurrent Optimization of Diffraction Fields from Binary Phase Mask for Three-Dimensional Nanopatterning Lee, Chihun; Chang, Gunho; Kim, Jaekyung; Hyun, Gayea; Bae, Gwangmin; So, Sunae; Yun, Jooyeong; et al, ACS PHOTONICS, v.10, no.4, pp.919 - 927, 2023-04 |
| Direct Fabrication of Hexagonally Ordered Ridged Nanoarchitectures via Dual Interference Lithography for Efficient Sensing Applications Jeon, Hwan Chul; Jeon, Tae Yoon; Shim, Tae Soup; Yang, Seung-Man, SMALL, v.10, no.8, pp.1490 - 1494, 2014-04 |
| Fundamental principles and development of proximity-field nanopatterning toward advanced 3D nanofabrication Nam, Sang-Hyeon; Hyun, Gayea; Cho, Donghwi; Han, Seonggon; Bae, Gwangmin; Chen, Haomin; Kim, Kisun; et al, NANO RESEARCH, v.14, no.9, pp.2965 - 2980, 2021-09 |
| Realization of all two-dimensional Bravais lattices with metasurface-based interference lithography Kim, Myungjoon; Kim, Nayoung; Shin, Jonghwa, NANOPHOTONICS, v.13, no.8, pp.1467 - 1474, 2024-04 |
| Standing-Wave-Assisted Creation of Nanopillar Arrays with Vertically Integrated Nanogaps for SERS-Active Substrates Jeon, Tae Yoon; Park, Sung-Gyu; Kim, Dong-Ho; Kim, Shin-Hyun, ADVANCED FUNCTIONAL MATERIALS, v.25, no.29, pp.4681 - 4688, 2015-08 |
| Sub-50 nm period patterns with EUV interference lithography Solak, HH; David, C; Gobrecht, J; Golovkina, V; Cerrina, F; Kim, Sang Ouk; Nealey, PF, MICROELECTRONIC ENGINEERING, v.67-8, pp.56 - 62, 2003-06 |
| 포토 레지스트 위의 선 격자 구조를 활용한 표면 플라즈몬 리소그래피의 결과 및 분석 = Fabrication results and analysis in surface plasmon lithography using line grating structure on photoresistlink 김용민; Kim, Yong-Min; et al, 한국과학기술원, 2014 |
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