DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jung, Yeon Sik | ko |
dc.contributor.author | Chang, Jae-Byum | ko |
dc.contributor.author | Verploegen, Eric | ko |
dc.contributor.author | Berggren, Karl K. | ko |
dc.contributor.author | Ross, C. A. | ko |
dc.date.accessioned | 2013-03-11T17:10:56Z | - |
dc.date.available | 2013-03-11T17:10:56Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2010-03 | - |
dc.identifier.citation | NANO LETTERS, v.10, no.3, pp.1000 - 1005 | - |
dc.identifier.issn | 1530-6984 | - |
dc.identifier.uri | http://hdl.handle.net/10203/99690 | - |
dc.description.abstract | The templated self-assembly of block copolymer (BCP) thin films can generate regular arrays of 10-50 nm scale features with good positional and orientational accuracy, but the ordering, registration and pattern transfer of sub-10-nm feature sizes is not well established. Here, we report solvent-annealing and templating methods that enable the formation of highly ordered grating patterns with a line width of 8 nm and period 17 nm from a self-assembled poly(styrene-b-dimethylsiloxane) (PS-PDMS) diblock copolymer, The BCP patterns can be registered hierarchically on a larger-period BCP pattern, which can potentially diversify the available pattern geometries and enables precise pattern registration at small features sizes. Sub- 10-nm-wide tungsten nanowires with excellent order and uniformity were fabricated from the self-assembled patterns using a reactive ion etching process. | - |
dc.language | English | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.subject | BLOCK-COPOLYMER LITHOGRAPHY | - |
dc.subject | DIBLOCK COPOLYMER | - |
dc.subject | ARRAYS | - |
dc.subject | GRAPHOEPITAXY | - |
dc.subject | POLYMERS | - |
dc.subject | BLENDS | - |
dc.subject | ORDER | - |
dc.title | A Path to Ultranarrow Patterns Using Self-Assembled Lithography | - |
dc.type | Article | - |
dc.identifier.wosid | 000275278200043 | - |
dc.identifier.scopusid | 2-s2.0-77949474566 | - |
dc.type.rims | ART | - |
dc.citation.volume | 10 | - |
dc.citation.issue | 3 | - |
dc.citation.beginningpage | 1000 | - |
dc.citation.endingpage | 1005 | - |
dc.citation.publicationname | NANO LETTERS | - |
dc.identifier.doi | 10.1021/nl904141r | - |
dc.contributor.localauthor | Jung, Yeon Sik | - |
dc.contributor.localauthor | Chang, Jae-Byum | - |
dc.contributor.nonIdAuthor | Verploegen, Eric | - |
dc.contributor.nonIdAuthor | Berggren, Karl K. | - |
dc.contributor.nonIdAuthor | Ross, C. A. | - |
dc.description.isOpenAccess | N | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | Block copolymer | - |
dc.subject.keywordAuthor | poly(dimethylsiloxane) | - |
dc.subject.keywordAuthor | solvent anneal | - |
dc.subject.keywordAuthor | nanowire | - |
dc.subject.keywordAuthor | self-assembly | - |
dc.subject.keywordPlus | BLOCK-COPOLYMER LITHOGRAPHY | - |
dc.subject.keywordPlus | DIBLOCK COPOLYMER | - |
dc.subject.keywordPlus | ARRAYS | - |
dc.subject.keywordPlus | GRAPHOEPITAXY | - |
dc.subject.keywordPlus | POLYMERS | - |
dc.subject.keywordPlus | BLENDS | - |
dc.subject.keywordPlus | ORDER | - |
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