3차원 마이크로 디바이스 개발을 위한 나노 스테레오리소그래피 공정 개발에 관한 연구

Abstract

A nano-stereolithography (NSL) process has been developed for the fabrication of three-dimensional (3D) micro-devices with high spatital resolution of approximately 100 nm. In the NSL process, a complicated 3D structure can be created by stacking layer-by-layer, so it does not require any sacrificial layer or any supporting structure. A laminated layer was fabricated by means of solidifying liquid-state monomers using two-photon absorption (TPA) which was induced by a femtosecond laser. When the fabrication of a 3D stacked structure was finished, unsolidified liquid resins were rinsed by ethanol to develop the fabricated structures; then, the polymerized structure was only left on the glass substrate. Through this work, several 3D microstructures such as a micro-channel, shell structures, and photonic crystals were fabricated to evaluate the possibility of the developed system.