UV-nanoimprint lithography using a diamond-like carbon stamp

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Two-dimensional (2-D) and three-dimensional (3-D) diamond-like carbon (DLC) stamps for ultraviolet nanoimprint lithography (UV-NIL) were fabricated with two methods: namely, two-photon polymerization (TPP) patterning, followed by nanoscale-thick DLC coating; and a fluorine-doped (F-DLC) coating process, followed by O2 plasma etching. The DLC layer on top of polymer pattern or flat quartz substrate was formed using radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) process or Direct current (DC) and radio frequency (RF) magnetron sputtering process. It was also demonstrated that the DLC stamp with no anti-adhesion layer could be used for imprinting wafers on UV-NIL and the dimensions of the stamp's features correlated well with the corresponding imprinted features.
Publisher
International Society for Optical Engineering
Issue Date
2006-03
Language
English
Citation

PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, v.6151, no.2, pp.6151 - 6192

ISSN
0277-786X
URI
http://hdl.handle.net/10203/87539
Appears in Collection
ME-Journal Papers(저널논문)
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