UV-nanoimprint lithography using a diamond-like carbon stamp

Abstract

Two-dimensional (2-D) and three-dimensional (3-D) diamond-like carbon (DLC) stamps for ultraviolet nanoimprint lithography (UV-NIL) were fabricated with two methods: namely, two-photon polymerization (TPP) patterning, followed by nanoscale-thick DLC coating; and a fluorine-doped (F-DLC) coating process, followed by O2 plasma etching. The DLC layer on top of polymer pattern or flat quartz substrate was formed using radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) process or Direct current (DC) and radio frequency (RF) magnetron sputtering process. It was also demonstrated that the DLC stamp with no anti-adhesion layer could be used for imprinting wafers on UV-NIL and the dimensions of the stamp's features correlated well with the corresponding imprinted features.