A novel patterning method of low-resistivity metals

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Photocatalytic layers of amorphous TiO2 and polyvinyl alcohol were used for the patterning of low-resistivity metals such as copper and silver without using high cost materials and equipment.
Publisher
CHEMICAL SOC JAPAN
Issue Date
2005-01
Language
English
Article Type
Article
Keywords

THIN-FILM; COPPER

Citation

CHEMISTRY LETTERS, v.34, no.1, pp.82 - 83

ISSN
0366-7022
DOI
10.1246/cl.2005.82
URI
http://hdl.handle.net/10203/86645
Appears in Collection
CH-Journal Papers(저널논문)
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