X-ray diffraction and Raman scattering studies in B-10(+)-implanted Cd0.96Zn0.04Te thin films prepared by vacuum evaporation

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Polycrystalline Cd0.96Zn0.04Te thin films prepared by vacuum evaporation onto thoroughly cleaned glass substrates kept at room temperature were implanted with mass-analyzed beams of 100 keV boron ions (B-10(+)) at various doses ranging from 10(12) to 10(14) ions cm(-2). The X-ray diffraction pattern of the as-deposited film shows zinc blende structure with a predominant orientation along the [111] plane. The implanted films show a decrease in the [111] peak intensity and increase in the full-width at half-maximum (FWHM) with implantation dose. The surface roughness (rms) of the as-deposited film evaluated by atomic force microscopy is 3.7 nm and the value of roughness is found to increase with implantation dose. Raman spectra of the as-deposited films show longitudinal optic (LO) and transverse optic (TO) modes, which arise from CdTe-and ZnTe-like vibrations. There is no significant change in the Raman peak position due to implantation but the FWHM is found to be increased. This is probably due to the implantation-induced lattice disorder. The relative intensity of the Raman peaks and the area under the peaks were found to increase with implantation dose. These results are explained on the basis of the implantation-induced surface roughness and lattice disorder. (C) 2003 Kluwer Academic Publishers.
Publisher
SPRINGER
Issue Date
2003-02
Language
English
Article Type
Article
Keywords

ION-IMPLANTATION DAMAGE; CDTE; GAAS; SI; CDZNTE; TE; SPECTRA; HGCDTE; BORON; GASB

Citation

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, v.14, pp.69 - 73

ISSN
0957-4522
URI
http://hdl.handle.net/10203/85370
Appears in Collection
EE-Journal Papers(저널논문)
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