나노 복화(複畵)공정의 역방향 적층법을 이용한 직접적 나노패턴 생성에 관한 연구Directly Nano-precision Feature Patterning on Thin Metal Layer using Top-down Building Approach in nRP Process

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In this study, a new process to pattern directly on a thin metal layer using improved nano replication printing (nRP) process is suggested to evaluate the possibilities of fabricating a stamp for nano-imprinting. In the nRP process, any figure can be replicated from a bitmap figure file in the range of several micrometers with nano-scaled details. In the process, liquid-state resins are polymerized by two-photon absorption which is induced by femto-second laser. A thin gold layer was sputtered on a glass plate and then, designed patterns or figures were developed on the gold layer by newly developed top-down building approach. Generally, stamps fur nano-imprinting have been fabricated by using the costly electron-beam lithography process combined with a reactive ion-etching process. Through this study, the effectiveness of the improved nRP process is evaluated to make a stamp with the resolution of around 200nm with reduced cost.
Publisher
한국정밀공학회
Issue Date
2004-06
Language
Korean
Citation

한국정밀공학회지, v.21, no.6, pp.153 - 159

ISSN
1225-9071
URI
http://hdl.handle.net/10203/81712
Appears in Collection
ME-Journal Papers(저널논문)
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