원료물질에 따른 실리콘 질화막의 원자층 증착 특성 비교A Comparative Study on the Precursors for the Atomic Layer Deposition of Silicon Nitride Thin Films
- Publisher
- 한국재료학회
- Issue Date
- 2004-02
- Language
- Korean
- Citation
한국재료학회지, v.14, no.2, pp.141 - 145
- ISSN
- 1225-0562
- Appears in Collection
- MS-Journal Papers(저널논문)
- Files in This Item
- There are no files associated with this item.
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