Thickness-profile measurement of transparent thin-film layers by white-light scanning interferometry

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White-light scanning interferometry is increasingly used for precision profile metrology of engineering surfaces, but its current applications are limited primarily to opaque surfaces with relatively simple optical reflection behavior. A new attempt is made to extend the interferometric method to the thickness-profile measurement of transparent thin-film layers. An extensive frequency-domain analysis of multiple reflection is performed to allow both the top and the bottom interfaces of a thin-film layer to be measured independently at the same time by the nonlinear least-squares technique. This rigorous approach provides not only point-by-point thickness probing but also complete volumetric film profiles digitized in three dimensions. (C) 1999 Optical Society of America.
Publisher
OPTICAL SOC AMER
Issue Date
1999-10
Language
English
Article Type
Article
Keywords

INTERFEROGRAMS; INTERFERENCE; PROFILOMETRY; REFLECTION; SURFACE

Citation

APPLIED OPTICS, v.38, no.28, pp.5968 - 5973

ISSN
0003-6935
URI
http://hdl.handle.net/10203/77016
Appears in Collection
ME-Journal Papers(저널논문)
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