DC Field | Value | Language |
---|---|---|
dc.contributor.author | Boo, JH | ko |
dc.contributor.author | Lee, SB | ko |
dc.contributor.author | Ustin, SA | ko |
dc.contributor.author | Ho, W | ko |
dc.contributor.author | Maruska, HP | ko |
dc.contributor.author | Norris, PE | ko |
dc.contributor.author | Kim, IH | ko |
dc.contributor.author | Sung, C | ko |
dc.date.accessioned | 2013-03-02T22:00:08Z | - |
dc.date.available | 2013-03-02T22:00:08Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1998 | - |
dc.identifier.citation | SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2 BOOK SERIES: MATERIALS SCIENCE FORUM, v.264-2, pp.1 - 2 | - |
dc.identifier.issn | 0255-5476 | - |
dc.identifier.uri | http://hdl.handle.net/10203/75754 | - |
dc.description.abstract | Cubic SiC thin films have been grown on Si(100), Si(111), and Separation by Implanted Oxygen (SIMOX) Silicon On Insulator (SOI) substrates in the temperature range of 780 - 1000 degrees C using a single source precursors of diethylmethylsilane (DEMS), (CH3CH2)(2)-SiH(CH3), and Bis(trimethylsilyl) methane (BTMSM), [(CH3)(3)Si](2)-CH2. Crack-free epitaxial cubic SiC thin films were obtained on both carbonized and uncarbonized Si(111) substrates at 830 OC from DEMS and 900 degrees C with BTMSM. Highly oriented cubic SiC(100) thin films were also deposited on uncarbonized Si(100) surface at 1000 degrees C with DEMS. The growth temperature of DEMS was lowered to 900 degrees C on Si(100) when the substrate was initially carbonized at 830 degrees C with a supersonic jet of acetylene. Ploycrystalline cubic SiC thin films, however, were grown on SIMOX: Auger electron spectroscopy (AES) and ex situ by ellipsometry, x-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR), and transmission electron microscopy (TEM). | - |
dc.language | English | - |
dc.publisher | TRANSTEC PUBLICATIONS LTD | - |
dc.subject | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject | CRYSTALLINE | - |
dc.title | Growth of epitaxial cubic SiC thin films using single source precursors | - |
dc.type | Article | - |
dc.identifier.wosid | 000072751000044 | - |
dc.identifier.scopusid | 2-s2.0-3743076002 | - |
dc.type.rims | ART | - |
dc.citation.volume | 264-2 | - |
dc.citation.beginningpage | 1 | - |
dc.citation.endingpage | 2 | - |
dc.citation.publicationname | SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2 BOOK SERIES: MATERIALS SCIENCE FORUM | - |
dc.contributor.localauthor | Sung, C | - |
dc.contributor.nonIdAuthor | Boo, JH | - |
dc.contributor.nonIdAuthor | Lee, SB | - |
dc.contributor.nonIdAuthor | Ustin, SA | - |
dc.contributor.nonIdAuthor | Ho, W | - |
dc.contributor.nonIdAuthor | Maruska, HP | - |
dc.contributor.nonIdAuthor | Norris, PE | - |
dc.contributor.nonIdAuthor | Kim, IH | - |
dc.type.journalArticle | Article; Proceedings Paper | - |
dc.subject.keywordAuthor | single source precursors | - |
dc.subject.keywordAuthor | supersonic jet epitaxy | - |
dc.subject.keywordAuthor | carbonization | - |
dc.subject.keywordAuthor | cubic SiC thin film | - |
dc.subject.keywordPlus | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject.keywordPlus | CRYSTALLINE | - |
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