전자선 석판 기술에서 디지타이징과 노광후 굽기 최적화를 통한 40nm급 패턴제작에 관한 연구Study on 40 nm Electron Beam Patterning by Optimization of Digitizing Method and Post Exposure Bake
- Publisher
- 대한전자공학회
- Issue Date
- 1999-10
- Language
- Korean
- Citation
전자공학회지 D, v.36, no.10, pp.23 - 30
- ISSN
- 1975-2377
- Appears in Collection
- RIMS Journal Papers
- Files in This Item
- There are no files associated with this item.
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