마이크로 머시닝을 위한 고농도로 붕소가 도핑된 실리콘층의 부정합 전위의 억제Suppression of Misfit Dislocations in Heavily Boron-doped Silicon Laywes for Micro-machining
- Publisher
- 대한전자공학회
- Issue Date
- 1996-02
- Language
- Korean
- Citation
전자공학회논문지, v.33, no.2, pp.248 - 266
- ISSN
- 1016-135X
- Appears in Collection
- RIMS Journal Papers
- Files in This Item
- There are no files associated with this item.
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