Low-frequency noise characteristics in p-channel FinFETs

Abstract

We report on the characterization of low-frequency noise in fully depleted (FD) double-gate p-channel FinFETs. While the average noise follows a 1/f dependence, considerable device-to-device variations in noise level are observed due to the statistical fluctuation of the number of oxide traps involved. We found that the low-frequency noise in poly-Si-gated p-FinFETs is mainly governed by the carrier number fluctuation with correlated mobility fluctuation. The low-frequency noise characteristics indicate that the FinFET device can be a promising candidate for analog and RF applications.