COMPUTER-SIMULATION STUDY ON ATMOSPHERIC-PRESSURE CVD PROCESS FOR AMORPHOUS-SILICON CARBIDE
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | KOH, JH | ko |
| dc.contributor.author | Woo, Seong-Ihl | ko |
| dc.date.accessioned | 2013-02-27T03:43:21Z | - |
| dc.date.available | 2013-02-27T03:43:21Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1990-07 | - |
| dc.identifier.citation | JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.137, no.7, pp.2215 - 2222 | - |
| dc.identifier.issn | 0013-4651 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/66258 | - |
| dc.language | English | - |
| dc.publisher | ELECTROCHEMICAL SOC INC | - |
| dc.title | COMPUTER-SIMULATION STUDY ON ATMOSPHERIC-PRESSURE CVD PROCESS FOR AMORPHOUS-SILICON CARBIDE | - |
| dc.type | Article | - |
| dc.identifier.wosid | A1990DL56800041 | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 137 | - |
| dc.citation.issue | 7 | - |
| dc.citation.beginningpage | 2215 | - |
| dc.citation.endingpage | 2222 | - |
| dc.citation.publicationname | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | - |
| dc.contributor.localauthor | Woo, Seong-Ihl | - |
| dc.contributor.nonIdAuthor | KOH, JH | - |
| dc.type.journalArticle | Article | - |
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