DC Field | Value | Language |
---|---|---|
dc.contributor.author | H. Shin | ko |
dc.contributor.author | K. Noguchi | ko |
dc.contributor.author | X. Y. Qian | ko |
dc.contributor.author | N. jha | ko |
dc.contributor.author | G. W. Hills | ko |
dc.contributor.author | C. Hu | ko |
dc.date.accessioned | 2013-02-25T18:18:45Z | - |
dc.date.available | 2013-02-25T18:18:45Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1993-02 | - |
dc.identifier.citation | IEEE ELECTRON DEVICE LETTERS, v.14, no.2, pp.88 - 90 | - |
dc.identifier.issn | 0741-3106 | - |
dc.identifier.uri | http://hdl.handle.net/10203/64268 | - |
dc.description.abstract | The spatial variation of the oxide charging across a wafer in a magnetically enhanced reactive ion etcher (MERIE) was investigated and compared with that in a reactive ion etcher (RIE). The polarity as well as the magnitude of the oxide charging current were determined by evaluating quasi-static CV curves for MOS capacitors. In a MERIE etcher with a static magnetic field, oxide charging is negative for about half of the wafer and positive for the other half of the wafer. A model is proposed to explain how lateral magnetic field affects the spatial distribution of charging across the wafer in a MERIE etcher. | - |
dc.language | English | - |
dc.publisher | IEEE-Inst Electrical Electronics Engineers Inc | - |
dc.subject | PLASMA | - |
dc.title | Spatial Distribution of Thin Oxide Changing in Reactive Ion Etcher and MERIE Etcher | - |
dc.type | Article | - |
dc.identifier.wosid | A1993KJ10600015 | - |
dc.type.rims | ART | - |
dc.citation.volume | 14 | - |
dc.citation.issue | 2 | - |
dc.citation.beginningpage | 88 | - |
dc.citation.endingpage | 90 | - |
dc.citation.publicationname | IEEE ELECTRON DEVICE LETTERS | - |
dc.identifier.doi | 10.1109/55.215117 | - |
dc.contributor.localauthor | H. Shin | - |
dc.contributor.nonIdAuthor | K. Noguchi | - |
dc.contributor.nonIdAuthor | X. Y. Qian | - |
dc.contributor.nonIdAuthor | N. jha | - |
dc.contributor.nonIdAuthor | G. W. Hills | - |
dc.contributor.nonIdAuthor | C. Hu | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | PLASMA | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.