광화학 기상성장법에 의한 Si 기관상에서의 TaOx 박막제작에 관한 연구Fabrication of TaOx Thin Film on Si-Substrate by Photo-CVD Method

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 441
  • Download : 0
DC FieldValueLanguage
dc.contributor.author한봉명ko
dc.contributor.author김수용ko
dc.contributor.author김경식ko
dc.date.accessioned2013-02-25T18:18:05Z-
dc.date.available2013-02-25T18:18:05Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1992-01-
dc.identifier.citation한국표면공학회지, v.25, pp.126 - 132-
dc.identifier.urihttp://hdl.handle.net/10203/64264-
dc.languageKorean-
dc.publisher한국표면공학회-
dc.title광화학 기상성장법에 의한 Si 기관상에서의 TaOx 박막제작에 관한 연구-
dc.title.alternativeFabrication of TaOx Thin Film on Si-Substrate by Photo-CVD Method-
dc.typeArticle-
dc.type.rimsART-
dc.citation.volume25-
dc.citation.beginningpage126-
dc.citation.endingpage132-
dc.citation.publicationname한국표면공학회지-
dc.contributor.localauthor김수용-
dc.contributor.nonIdAuthor한봉명-
dc.contributor.nonIdAuthor김경식-
Appears in Collection
PH-Journal Papers(저널논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0