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Results 1-10 of 147 (Search time: 0.011 seconds).

NO Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1
Characteristics of the Deposition Rate per Unit Power on Pulsed-DC Magnetron Sputtering Source

An, Sang-Hyuk; In, Jung-Hwan; Chang, Hong-Young, PLASMA PROCESSES AND POLYMERS, v.6, no.12, pp.855 - 859, 2009-12

2
Effects of substrate bias voltage on plasma parameters in temperature control using a grid system

Bai, KH; Hong, JI; You, SJ; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.9, pp.4246 - 4250, 2001-09

3
Development of a dual inductively coupled plasma source for direct and remote plasma generation in a reactor

Uhm, S; Lee, KH; Chang, Hong-Young; Chung, CW, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS REVIEW PAPERS, v.44, no.2, pp.1081 - 1085, 2005-02

4
Mode transition for power dissipation induced by driving frequency in capacitively coupled plasma

You, SJ; Kim, HC; Chung, CW; Chang, Hong-Young; Lee, JK, JOURNAL OF APPLIED PHYSICS, v.94, pp.7422 - 7426, 2003-12

5
On inductively coupled plasmas for next-generation processing

Lee, YK; Lee, DS; Bai, KH; Chung, CW; Chang, Hong-Young, SURFACE COATINGS TECHNOLOGY, v.169, pp.20 - 23, 2003-06

6
Computational characterization of cutoff probe system for the measurement of electron density

Na, Byung-Keun; Kim, Dae-Woong; Kwon, Jun-Hyuk; Chang, Hong-Young; Kim, Jung-Hyung; You, Shin-Jae, PHYSICS OF PLASMAS, v.19, no.5, 2012-05

7
Diode laser-induced fluorescence measurements of metastable argon ions in a magnetized inductively coupled plasma

Jun, S; Chang, Hong-Young; McWilliams, R, PHYSICS OF PLASMAS, v.13, pp.122 - 123, 2006-05

8
Sheath width effect on the determination of plasma frequency in the cutoff probe

Kim, D. W.; You, S. J.; Kim, J. H.; Chang, Hong-Young; Oh, Wang-Yuhl, APPLIED PHYSICS LETTERS, v.100, no.24, 2012-06

9
Role of low-frequency power in dual-frequency capacitive discharges

Ahn, Seung Kyu; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.95, no.11, 2009-09

10
Fast measurement of a pulsed plasma using a Fourier cutoff probe

Na, Byung-Keun; You, Kwang-Ho; Kim, D. -W.; Seo, Byong-Hoon; Chang, Hong-Young; You, S. -J.; Lee, Yun-Seong, JOURNAL OF INSTRUMENTATION, v.7, 2012-04

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