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Results 141-147 of 147 (Search time: 0.013 seconds).

NO Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
141
On the plasma uniformity of multi-electrode CCPs for large-area processing

Jung, Park Gi; Hoon, Seo Sang; Wook, Chung Chin; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.22, no.5, 2013-10

142
A study on asymmetric current in plasma-mediated electrosurgery

Seol, Youbin; Kim, J. H.; Na, Byung-Keun; You, S. J.; Choi, EH; Chang, Hong-Young, CURRENT APPLIED PHYSICS, v.15, no.3, pp.169 - 173, 2015-03

143
On the possibility of the multiple inductively coupled plasma and helicon plasma sources for large-area processes

Lee, Jinwon; Lee, Yun-Seong; Chang, Hong-Young; An, Sang-Hyuk, PHYSICS OF PLASMAS, v.21, no.8, 2014-08

144
Micro-arc ignition on the oily surface of capacitively-coupled plasma

Kim, Yonghoon; Lee, Hunsu; Chang, Hong-Young, CURRENT APPLIED PHYSICS, v.15, no.3, pp.313 - 318, 2015-03

145
Effect of reactor surface modification on the neutral gas temperature in a transformer-coupled toroidal plasma

You, Daeho; Lee, Yun-Seong; Lee, Jeong Beom; Chang, Hong-Young, CURRENT APPLIED PHYSICS, v.15, no.3, pp.183 - 189, 2015-03

146
Characteristics of an inductively coupled plasma source using a parallel resonance antenna

Lee, Dongseok; Lee, YK; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.13, pp.701 - 706, 2004-11

147
Study on CH4 dry reforming process by high power inductively coupled plasma torch at atmospheric pressure

Song, Hohyun; Lee, Yun-Seong; Kwak, Geunjae; Chang, Hong-Young, CURRENT APPLIED PHYSICS, v.20, no.1, pp.196 - 204, 2020-01

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