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Characteristics of the Deposition Rate per Unit Power on Pulsed-DC Magnetron Sputtering Source An, Sang-Hyuk; In, Jung-Hwan; Chang, Hong-Young, PLASMA PROCESSES AND POLYMERS, v.6, no.12, pp.855 - 859, 2009-12 |
Development of multiple inductively coupled plasma sources using coaxial transmission line for large-area processes Lee, Jin-Won; An, Sang-Hyuk; Kim, J. H.; Lee, Yun-Seong; Chang, Hong-Young, CURRENT APPLIED PHYSICS, v.16, no.3, pp.415 - 420, 2016-03 |
On the possibility of the multiple inductively coupled plasma and helicon plasma sources for large-area processes Lee, Jinwon; Lee, Yun-Seong; Chang, Hong-Young; An, Sang-Hyuk, PHYSICS OF PLASMAS, v.21, no.8, 2014-08 |
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