Frequency Characteristics of Anodic Oxide Films on Tantalum
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | D.N. Lee | ko |
| dc.contributor.author | Yoon, Young-Ku | ko |
| dc.date.accessioned | 2013-02-25T12:07:02Z | - |
| dc.date.available | 2013-02-25T12:07:02Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1973 | - |
| dc.identifier.citation | 원자력학회지, v.5, no.1, pp.30 - 37 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/62083 | - |
| dc.language | English | - |
| dc.publisher | 한국원자력학회 | - |
| dc.title | Frequency Characteristics of Anodic Oxide Films on Tantalum | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 5 | - |
| dc.citation.issue | 1 | - |
| dc.citation.beginningpage | 30 | - |
| dc.citation.endingpage | 37 | - |
| dc.citation.publicationname | 원자력학회지 | - |
| dc.contributor.nonIdAuthor | D.N. Lee | - |
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