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Results 1-10 of 151 (Search time: 0.008 seconds).

NO Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
T-top Free Chemically Amplified Resists Containing Vinyllactam Derivatives

Jung, Min Ho; Kim, Jin-Baekresearcher, 한국고분자학회 1997년도 춘계 학술대회, pp.108 - 109, 한국고분자학회, 1997-04

Silicon Containing Bilayer Resist

Lee, Jini; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baekresearcher, 한국고분자학회 2001년 추계학술대회, pp.162 - 162, 한국고분자학회, 2001-10

The effect of ionic conductivity and the performance of PDLC films

Kim, Jin-Baekresearcher; Lee, Myung Gu; Park, Jong Jin; Lee, CS, Pacific Polymer Conference, pp.333 - 333, 1997

Effect of acid structure on deprotection of poly(2-trimethylsilyl-2-propyl methacrylate)

Kim, Hyun-Woo; Kim, Jin-Baekresearcher, 한국고분자학회 1998년도 추계 학술대회 , pp.80 - 81, 한국고분자학회, 1998-10-16

Synthesis and Lithographic Characterization of Poly(N-p(tert-butoxycarbonyloxy)phenyl dimethacrylamide

Kim, Jin-Baekresearcher, 한국고분자학회 1997년도 춘계 학술대회 , pp.100 - 101, 한국고분자학회, 1997-04

Synthesis of photoresist containing acetal protected B-keto acid group

Kim, Jin-Baekresearcher; Kim, Kyung Sun, 한국고분자학회 2002년 추계학술대회 , v.27, no.2, pp.255 - 255, 한국고분자학회, 2002-10

Synthesis and Lithographic Characterization of Poly(hydroxystyrene-co-tert-butyl acrylate-co-3-(t-butoxycarbonyl)-1-vinylcaprolactam

Kim, Jin-Baekresearcher; Jung, Min Ho; Jung, Jong Ho, 한국고분자학회 1996년도추계 학술대회 , v.21, no.2, pp.714 - 715, 한국고분자학회, 1996-10

Molecular Resists with t-Butyl Cholate as a Dendrimer Core for 193 nm Photoresists

Kim, Jin-Baekresearcher; Oh, Tae-Hwan, Advances in Resist Technology and Processing XIX, pp.333 - 333, SPIE, 2002-03-04

New dry-developable chemically amplified photoresist

Kim, Jin-Baekresearcher; Kim, Hyun-Woo, Advances in Resist Technology and Processing XV, v.3333, pp.786 - 793, 1998-02-23

Photoresist Technology

Kim, Jin-Baekresearcher, Advanced and Future Microelectronics Workshop, v.0, no.0, ETRI, 1989

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