Showing results 6 to 8 of 8
Organic-Inorganic Hybrid Resists Based on Methoxysilane Cross-Linker for Deep UV lithography Park, Ji Young; Kim, Jin-Baek, European Mask and Lithography Conference, pp.0 - 0, 2008-01-28 |
Photobleaching Deep UV Resists Based on Single Component Nonchemically Amplified Resist System Kim, Kyoung-Seon; Park, Ji Young; Kim, Sumin; Kim, Jin-Baek, SPIE-The International Society for Optical Engineering, 2006-02-12 |
The Encapsulation of EL Materials Photo-Patterning using β-cyclodextrin Park, Ji Young; Kim, Jin-Baek, SPIE-The International Society for Optical Engineering, pp.0 - 0, SPIE, 2005-02-27 |
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