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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Water-induced degradation of chromium fluoride films Kim, EN; Hong, Daniel Seungbum; Gorman, JD; Lim, SC; Moon, SY; Kim, DW; No, Kwangsoo, THIN SOLID FILMS, v.324, no.1-2, pp.292 - 299, 1998-07 | |
| Effects of Seeding Layer on Orientation and Phase-formation of Sol-gel-derived Lanthanum-modified Lead-Zirconate-Titanate films on Glass Lee, JS; Kim, CJ; Yoon, DS; Choi, CG; No, Kwangsoo, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.34, no.4A, pp.1947 - 1951, 1995-04 | |
| Effects of sol-gel processing variables on the texture growth of LiNbO3 thin film Won, Dong Hoon; Hur, Nam Hwi; No, Kwangsoo, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.35, no.1A, pp.210 - 215, 1996-01 | |
| Optical property simulation of single-layer halftone phaseshifting masks for DUV microlithography Jiang, ZT; Hong, Daniel Seungbum; Kim, E; Bae, Byeong-Soo; No, Kwangsoo; Hwangbo, CK; Lim, SC; Woo, SG; Koh, YB, SEMICONDUCTOR SCIENCE AND TECHNOLOGY, v.11, no.10, pp.1450 - 1455, 1996-10 | |
| Effects of texturing and microbridge length on the IR responsivity of YBa2Cu3Ox thin film Bae, Sung Joon; Hong, Daniel Seungbum; Kim, Eun Ah; Shin, Woo Suck; Cho, Chang Hyun; Kim, Young Kun; Bae, Youn Soo; Sung, Tae Hyun; No, Kwangsoo, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.35, no.3, pp.1716 - 1719, 1996-03 | |
| Fabrication and characterization of PZT/TiO(x)/SiO(2)/SiN(x)/SiO(2)/Si structure for acousto-optic device applications Lee, C; Lee, C; Liu, JY; Jeon, Y; No, Kwangsoo, INTEGRATED FERROELECTRICS, v.35, no.1-4, pp.1741 - 1752, 2001 | |
| Formation of ferroelectric nano-domains using scanning force microscopy for the future application of memory devices Shin, Hyun Jung; Woo, Jung Won; Hong, Daniel Seungbum; Jeon, Jong Up; Park, Eugene; No, Kwangsoo, INTEGRATED FERROELECTRICS, v.31, no.1-4, pp.163 - 171, 2000 | |
| Optical properties of thin amorphous silicon film on a phase shift mask for 157 nm lithography Kim, SungKwan; Kim, YangSoo; Choi, YoungMin; Choi, JongWan; Hong, Jongin; Shon, JungMin; Sung, Tae-Hyun; No, Kwangsoo, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.43, no.5A, pp.2523 - 2529, 2004-05 | |
| Effects Of Pulling Speed And Hot Zone Temperature On The Directional Growth Of YBa2Cu3Ox Superconductor No, Kwangsoo; Shin, WS; Kim, W; Shim, G, JOURNAL OF MATERIALS SCIENCE, v.30, no.12, pp.3183 - 3187, 1995-06 | |
| Application of DV-Xa Cluster Method to the Cr-Al Oxide Mask Materials for Deep UV Lithography Jiang, Zhong-Tao; Yamaguchi, Tomuo; Kim, Eunah; Hong, Seung Bum; No, Kwangsoo; Kang, Young Seog; Park, Soon Ja; Koh, Young Bum, BULLETIN OF THE SOCIETY FOR DISCRETE VARIATIONAL XA, v.10, no.2, pp.22 - 26, 1997-01 |
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