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Results 1-10 of 65 (Search time: 0.006 seconds).

NO Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1
Chromium Aluminim Oxide Phase-Shifting Mask Material for 193nm Lithography

No, Kwangsoo; Kim, Eun Ah; Hong, Seung Bum; Moon, Seong-Yong, Third International Symposium on 193nm Lithography, pp.127 -, 1997

2
Adaptive interferometer measurement of the piezoelectric and electro-optic coefficients of the spin-coated PZT thin films

Spirin, VV; Lee, C; No, Kwangsoo; Sokolov, IA, Smart Structures and Materials 1998: Sensory Phenomena and Measurement Instrumentation for Smart Structures and Materials, v.3330, pp.59 - 66, 1998-03-02

3
Decompositon and Coating Characteristics of Sol-Gel PLT Solutions

Bae, Byeong-Soo; Kim, SU; Koo, J; Yoon, DS; No, Kwangsoo, ACerS 98th Annual Meeting, 1996

4
Single-Layer Halftone Phase-Shifting Masks for DUV Microlithography : Optical Property Lation and Chromium Compound Film Preparation

No, Kwangsoo; Bae, Byeong-Soo; Jiang, ZT; Song, S; Kim, E; Bae, BS; Lim, SC; Woo, SG; Koh, YB, Eighth International Conference on Solid Films and Surfaces, 1996-01-01

5
The Applicability of SiFxNy Film as Bottom Antireflective Layer in Deep Ultraviolet Lithography

No, Kwangsoo; Bae, Byeong-Soo; Jun, BH; Han, SS; Kim, DW; Kang, HY; Koh, YB, MRS Symp. Proc., pp.115 - 120, Materials Research Society, 1996-01-01

6
Effects of oxygen annealing of MgO thin films on the phase formation and electrical properties of PZT thin films

No, Kwangsoo, PACRIM, 1998-01-01

7
Effects of Phosphorus Doping Level on Stress Profile of LPCVD Polysilicon Films in Surface Micromachining

No, Kwangsoo, ICAMD, 1996-01-01

8
Cr-Based Attenuated Phase Shifting Mask Materials for 193 nm Lithography

No, Kwangsoo; Kim, E; Hong, SB; Jiang, ZT; Lim, S; Woo, SG; Koh, YB, Second Inter. sympo. on 193 nm Lithography86, 1996-01-01

9
Effects of NH3 Carrier Gas on the Deposition and Electrical Characterics of SrTiO3 Films Grown by ECR Plasma Assisted MOCVD

No, Kwangsoo; Lee, JS; Song, HW; Jun, BH; Yu, BG, International Symposium on Applications of Ferroelectric Thin Films, 1996-01-01

10
Control of Stress Profile Two-step Phosporus Dopping in Sueface Micromachined Polysilicon Structure

No, Kwangsoo; Lee, CS; Chung, HH; Baek, KH; Lee, JH; Yoo, HJ, ISPSA, 1996-01-01

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