[특집]Photoresist
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Jin-Baek Kim | ko |
| dc.date.accessioned | 2013-02-25T03:20:48Z | - |
| dc.date.available | 2013-02-25T03:20:48Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1990-11 | - |
| dc.identifier.citation | POLYMER SCIENCE AND TECHNOLOGY , v.1, no.6, pp.370 - 385 | - |
| dc.identifier.issn | 1225-0260 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/59431 | - |
| dc.language | Korean | - |
| dc.publisher | 한국고분자학회 | - |
| dc.title | [특집]Photoresist | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 1 | - |
| dc.citation.issue | 6 | - |
| dc.citation.beginningpage | 370 | - |
| dc.citation.endingpage | 385 | - |
| dc.citation.publicationname | POLYMER SCIENCE AND TECHNOLOGY | - |
| dc.contributor.localauthor | Jin-Baek Kim | - |
- Appears in Collection
- CH-Journal Papers(저널논문)
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