단결정 Si 표면에의 $Al_2O_3$ 화학증착에 있어서 반응변수가 증착속도 및 표면형상에 미치는 영향에 대한 연구 = The effects of deposition variables on deposition rate & morphology in the chemical vapor deposition of $Al_2O_3$ onto silicon single crystal

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Advisors
천성순researcherChun, Soung-Soonresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
1983
Identifier
63915/325007 / 000811069
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 재료공학과, 1983.2, [ [iii], 48 p. ]

Keywords

Single crystal.; Supersaturation.; 표면 반응.; 반응 변수.

URI
http://hdl.handle.net/10203/51923
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=63915&flag=dissertation
Appears in Collection
MS-Theses_Master(석사논문)
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