고집적 FRAM 메모리에서 Ir과 Ru의 확산방지막으로서의 특성평가Characteristics of Ir and Ru as diffusion barrier for highly integrated memory devices
- Advisors
- 김호기researcher; Kim, Ho-Giresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 2000
- Identifier
- 162666/325007 / 000983836
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 2000.8, [ iv, 76 p. ]
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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