D.C. 마그네트론 반응성 스퍼터링법으로 증착한 ITO박막에 있어서 고유응력, 배향성 그리고 밀도가 비저항에 미치는 영향Effect of density, intrinsic stress and crystallographic orientation on resistivity of ITO thin films deposited by D.C. magnetron reactive sputtering

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dc.contributor.advisor최시경-
dc.contributor.advisorChoi, Si-Kyung-
dc.contributor.author이정일-
dc.contributor.authorLee, Jung-Il-
dc.date.accessioned2011-12-15T01:33:07Z-
dc.date.available2011-12-15T01:33:07Z-
dc.date.issued2000-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=158616&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/50789-
dc.description학위논문(석사) - 한국과학기술원 : 재료공학과, 2000.2, [ iv, 74 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subject밀도-
dc.subject응력-
dc.subject산화물 전극-
dc.subject마그네트론 스퍼터링-
dc.subjectMagnetron sputtering-
dc.subjectDensity-
dc.subjectStress-
dc.subjectITO-
dc.titleD.C. 마그네트론 반응성 스퍼터링법으로 증착한 ITO박막에 있어서 고유응력, 배향성 그리고 밀도가 비저항에 미치는 영향-
dc.title.alternativeEffect of density, intrinsic stress and crystallographic orientation on resistivity of ITO thin films deposited by D.C. magnetron reactive sputtering-
dc.typeThesis(Master)-
dc.identifier.CNRN158616/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000983444-
dc.contributor.localauthor최시경-
dc.contributor.localauthorChoi, Si-Kyung-
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MS-Theses_Master(석사논문)
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