DC reactive magnetron sputtering 방법으로 증착된 MCM용 비정질 $Ta_2O_5$ 박막 커패시터에 관한 연구 = A study on the amorphous $Ta_2 O_5$ thin film capacitors deposited by DC reactive magnetron sputtering for MCM applications

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Advisors
백경욱researcherPaik, Kyung-Wookresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
1999
Identifier
150090/325007 / 000973647
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 재료공학과, 1999.2, [ iv, 72 p. ]

Keywords

전기전도기구; 반응성스퍼터링; 산화탄탈륨; 멀티칩모듈; 비정질; Amorphous; Conduction mechanism; Reactive sputtering; Tantalum oxide; MCM

URI
http://hdl.handle.net/10203/50744
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=150090&flag=dissertation
Appears in Collection
MS-Theses_Master(석사논문)
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